{"title":"Seven subthreshold flip-flop cells","authors":"Havard Pedersen Alstad, S. Aunet","doi":"10.1109/NORCHP.2007.4481061","DOIUrl":null,"url":null,"abstract":"For ultra-low-power applications, operating the transistors in their subthreshold region is an effective way of reducing the power dissipation of a circuit. This paper presents a comparative study of the performance of seven D-flip-flop cells operating in the subthreshold region, based on simulations in a 90 nm CMOS technology. Simulations have been performed with a supply voltage ranging from 150 mV to 350 mV. The best PDP and EDP numbers at 175 mV is 13 aJ and 10 yJs, respectively.","PeriodicalId":448673,"journal":{"name":"Norchip 2007","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Norchip 2007","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NORCHP.2007.4481061","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 19
Abstract
For ultra-low-power applications, operating the transistors in their subthreshold region is an effective way of reducing the power dissipation of a circuit. This paper presents a comparative study of the performance of seven D-flip-flop cells operating in the subthreshold region, based on simulations in a 90 nm CMOS technology. Simulations have been performed with a supply voltage ranging from 150 mV to 350 mV. The best PDP and EDP numbers at 175 mV is 13 aJ and 10 yJs, respectively.