{"title":"An investigation of SEM overlay metrology","authors":"T. Koike, T. Ikeda, H. Abe, F. Komatsu","doi":"10.1109/IMNC.1999.797541","DOIUrl":null,"url":null,"abstract":"We examine the accuracy and precision of SEM-based overlay metrology in the case of marks covered with thick resist film. We measured the overlay error by optimizing beam condition, and compared the results with those obtained by optics-based measurement.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1999.797541","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We examine the accuracy and precision of SEM-based overlay metrology in the case of marks covered with thick resist film. We measured the overlay error by optimizing beam condition, and compared the results with those obtained by optics-based measurement.