An Optical Impedance Investigation of a Gold Electrodeposition System

B. Bozzini, C. Mele, L. D'urzo
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Abstract

In this paper in situ visible electroreflectance measurements have been carried out in order to extract new electrochemical information from the dependence of R/R on the frequency of potential modulation. The behaviour of some typical components of a Au electrodeposition bath has been investigated: a metal salt (KAu(CN)2), a supporting electrolyte (NaClO4), a metal cation complexing agent (KCN). The voltammetric behaviour of the relevant systems has been investigated by means of Cyclic Voltammetry (CV) and Electrochemical Impedance Spectrometry (EIS). The optical and current density dynamics have been compared applying a potential square-wave modulation with frequencies in the range 1÷300 Hz and have been found to exhibit clearly different time-constants. Sensitivity to the electrolyte chemistry and radiation-wavelength have been proved for optical impedance.
金电沉积系统的光阻抗研究
为了从R/R与电位调制频率的关系中提取新的电化学信息,本文进行了原位可见电反射测量。研究了金属盐(KAu(CN)2)、支撑电解质(NaClO4)、金属阳离子络合剂(KCN)等金属电沉积液的典型组分的行为。利用循环伏安法(CV)和电化学阻抗谱法(EIS)研究了相关体系的伏安行为。应用频率在1÷300 Hz范围内的电位方波调制,比较了光密度和电流密度动态,发现它们表现出明显不同的时间常数。光学阻抗对电解质化学和辐射波长的敏感性已被证明。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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