Optoelectronic properties of nanocrystalline tungsten oxide thin films

A. Jayatissa, S. Cheng
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引用次数: 1

Abstract

Tungsten oxide (WO/sub 3/) is an important electronic material investigated for solid state sensors, electrochromic and optoelectronic devices. In this study, optoelectronic properties of nanocrystalline WO/sub 3/ thin films, prepared by vacuum evaporation followed by thermal annealing were investigated. The structural and optoelectronic properties were measured for systematically annealed samples in 100-600/spl deg/C range. It was found that the optical transmittance and electrical conductivity were varied in 10-80% range and 10/sup -3/- 10/sup -8/ (/spl Omega/.cm)/sup -1/ range, respectively, by change of annealing temperature. Study of surface and structural properties reveals that pronounced effect on properties can be made by annealing even at 100/spl deg/C. Results indicated that the properties Of WO/sub 3/ can be tuned by annealing process because of change of crystallinity from amorphous to nanomonocrystalline to polycrystalline structures.
纳米氧化钨薄膜的光电特性
氧化钨(WO/ sub3 /)是固态传感器、电致变色和光电子器件研究的重要电子材料。本文研究了真空蒸发-热退火法制备的纳米晶WO/ sub3 /薄膜的光电性能。在100-600/spl度/C范围内测量了系统退火样品的结构和光电子性能。结果表明,随着退火温度的变化,材料的透光率和电导率分别在10 ~ 80%和10/sup -3/- 10/sup -8/ (/spl Omega/.cm)/sup -1/范围内变化。对表面和结构性能的研究表明,即使在100/spl℃的温度下退火也能对性能产生明显的影响。结果表明,由于WO/sub 3/的结晶度从非晶结构转变为纳米单晶结构,再转变为多晶结构,因此可以通过退火工艺调整WO/sub 3/的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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