Charge Trapping and Stability of E-Mode p-gate GaN HEMTs Under Soft- and Hard- Switching Conditions

F. Masin, M. Meneghini, E. Canato, A. Barbato, C. D. Santi, A. Stockman, A. Banerjee, P. Moens, E. Zanoni, G. Meneghesso
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引用次数: 5

Abstract

This paper reports a detailed analysis of the performance and stability of E-mode GaN HEMTs under soft and hard switching conditions. We developed a novel on-wafer setup that controls the overlapping between the gate and drain pulses and, simultaneously, senses the current at the source. This allowed us to plot the instantaneous power, the switching I-V locus and evaluate the switching losses on wafer level. The dynamic on-resistance RDS,ON is evaluated during hard and soft switching at room temperature and high temperature. The results demonstrate that (i) the properties of the buffer impact on dynamic-Ron, in soft- and hard-switching; devices with non-optimized buffer have stronger dynamic-Ron under hard switching; (ii) Ron-increase under hard switching is not strongly influenced by switching (power) losses; (iii) results indicate that a higher dynamic-Ron in hard switching is correlated to a wider switching locus. The proposed testing approach can be used as a screening tool to evaluate – in one single measurement – the switching losses, the dynamic-Ron and the impact of hard-switching on wafer level.
软、硬开关条件下e模p栅GaN hemt的电荷俘获与稳定性
本文详细分析了e模GaN hemt在软开关和硬开关条件下的性能和稳定性。我们开发了一种新颖的晶片上装置,可以控制栅极和漏极脉冲之间的重叠,同时在源端检测电流。这使我们能够绘制瞬时功率,开关I-V轨迹并评估晶圆级的开关损耗。对室温和高温下硬开关和软开关的动态导通电阻RDS、ON进行了评估。结果表明:(1)软开关和硬开关中缓冲器对动态ron的影响特性;非优化缓冲器器件在硬开关下具有更强的动态ron;(ii)硬开关下的通度增加不受开关(功率)损耗的强烈影响;(iii)结果表明,硬开关中较高的动态ron与更宽的开关位点相关。所提出的测试方法可以作为一种筛选工具,在一次测量中评估开关损耗、动态损耗和硬开关对晶圆级的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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