Development and application of a new semiconductive glaze insulator

O. Nigol, E. Cherney
{"title":"Development and application of a new semiconductive glaze insulator","authors":"O. Nigol, E. Cherney","doi":"10.1109/TPAS.1978.354715","DOIUrl":null,"url":null,"abstract":"A new semiconductive glaze insulator with superior glaze and greatly improved contamination performance has been developed for use in vertical and V-string positions. This insulator makes it possible to convert many existing lines to operation at higher voltages and to design new lines with greatly reduced tower head dimensions.","PeriodicalId":250579,"journal":{"name":"1975 EIC 12th Electrical/Electronics Insulation Conference","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1978-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1975 EIC 12th Electrical/Electronics Insulation Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TPAS.1978.354715","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

A new semiconductive glaze insulator with superior glaze and greatly improved contamination performance has been developed for use in vertical and V-string positions. This insulator makes it possible to convert many existing lines to operation at higher voltages and to design new lines with greatly reduced tower head dimensions.
新型半导釉绝缘子的研制与应用
一种新型的半导釉绝缘体,具有优良的釉面性能和大大改善的污染性能,用于垂直和v串位置。这种绝缘体可以将许多现有的线路转换为在更高的电压下运行,并可以设计大大减小塔头尺寸的新线路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信