CMOS Photodiode Design for Gamma Camera Application

N. S. Salahuddin, M. Paindavoine
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Abstract

We designed new photodiodes sensors including current mirror amplifiers. These photodiodes have been fabricated using a CMOS 0.6 micrometers process from Austria Micro System (AMS). The photodiode areas are respectively 1 mm × 1 mm and 0.4 mm × 0.4 mm with fill factor 98% and total chip area is 2 square millimetres. The sensor pixels show a logarithmic response in illumination and are capable of detecting very low blue light (less than 0.5 lux) . These results allow to use our sensor in new gamma camera solid-state concept.
用于伽马相机的CMOS光电二极管设计
我们设计了新的光电二极管传感器,包括电流镜放大器。这些光电二极管是采用奥地利微系统公司(AMS)的CMOS 0.6微米工艺制造的。光电二极管面积分别为1mm × 1mm和0.4 mm × 0.4 mm,填充系数为98%,总芯片面积为2平方毫米。传感器像素在照明中显示对数响应,并且能够检测非常低的蓝光(小于0.5勒克斯)。这些结果允许将我们的传感器用于新的伽马相机固态概念。
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