Non-linearity analysis of triple gate SOI nanowires MOSFETS

B. Cardoso Paz, Rodrigo Trevisoli Doria, M. Cassé, S. Barraud, G. Reimbold, M. Vinet, O. Faynot, M. Pavanello
{"title":"Non-linearity analysis of triple gate SOI nanowires MOSFETS","authors":"B. Cardoso Paz, Rodrigo Trevisoli Doria, M. Cassé, S. Barraud, G. Reimbold, M. Vinet, O. Faynot, M. Pavanello","doi":"10.1109/SBMICRO.2016.7731355","DOIUrl":null,"url":null,"abstract":"This work aims to explore the harmonic distortion of triple gate SOI nanowires MOSFETs, considering long channel devices operating in saturation regime as amplifiers. The Integral Function Method is used to extract the total, second and third order harmonic distortions, which are the main figures of merit analyzed in this work. Low field mobility, surface roughness scattering and series resistance are correlated to the distortion minima. Narrower devices have shown improved linearity.","PeriodicalId":113603,"journal":{"name":"2016 31st Symposium on Microelectronics Technology and Devices (SBMicro)","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 31st Symposium on Microelectronics Technology and Devices (SBMicro)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SBMICRO.2016.7731355","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

This work aims to explore the harmonic distortion of triple gate SOI nanowires MOSFETs, considering long channel devices operating in saturation regime as amplifiers. The Integral Function Method is used to extract the total, second and third order harmonic distortions, which are the main figures of merit analyzed in this work. Low field mobility, surface roughness scattering and series resistance are correlated to the distortion minima. Narrower devices have shown improved linearity.
三栅SOI纳米线mosfet的非线性分析
本工作旨在探讨三栅极SOI纳米线mosfet的谐波失真,考虑在饱和状态下工作的长通道器件作为放大器。利用积分函数法提取了总、二阶和三阶谐波畸变,这是本工作分析的主要优点。低场迁移率、表面粗糙度散射和串联电阻与畸变最小值有关。更窄的器件显示出更好的线性度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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