Current conduction paths in GaN

H. Morkoç, A. Baski, R. Molnar, J. Jasinski, Z. Liliental-Weber
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Abstract

Studies current conduction using C-AFM on a variety of GaN samples grown by MBE and HVPE on sapphire, both before and after performing chemical etches to delineate defect structures. Samples employed both side ohmic contacts and a conventional Schottky barrier configuration. The results indicate that the major current conduction paths in forward direction below the threshold of the metal-semiconductor junction turn-on are associated with prismatic planes. The same is true for the reverse current case. The Schottky barrier experiments indicate the planarized surfaces exhibit much lower excess current.
氮化镓中的电流传导路径
利用C-AFM研究了由MBE和HVPE在蓝宝石上生长的各种GaN样品在进行化学蚀刻以描绘缺陷结构之前和之后的电流传导。样品采用了两侧欧姆接触和传统的肖特基势垒结构。结果表明,在金属-半导体结导通阈值以下的正向电流传导路径主要与棱柱面相关。对于反向电流的情况也是如此。肖特基势垒实验表明,平面化表面表现出更低的过量电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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