M. Eray, N. Dogan, Lianjun Liu, A. Koch, D. Moffett, M. Silber, B. V. Van Wie
{"title":"A micromachined polyimide aperture for stable bilayer lipid membrane (BLM)s","authors":"M. Eray, N. Dogan, Lianjun Liu, A. Koch, D. Moffett, M. Silber, B. V. Van Wie","doi":"10.1109/DRC.1993.1009616","DOIUrl":null,"url":null,"abstract":"Summary form only given. Silicon micromachining is used to fabricate reproducible miniature apertures over photosensitive polyimide (PPI) layers (septa), with highly controllable dimensions. PPI, having a high level of planarization, chemical inertness, a low dielectric constant, and good mechanical strength, is a very suitable material to be used as BLM septa. Apertures of approximately 5 mu m thickness and approximately 40 mu m diameter in PPI septa suspended over thick silicon rims were realized. The fabrication process includes double-side oxide growth on the wafer, spin-coating the PPI and its patterning, back surface anisotropic window etching, and a final cleaning step. Apertures with high circular symmetry were fabricated using this process. The BLM is formed by dropping a small amount of phospholipid-alkane solution over the PPI aperture. An initially few- mu m-thick membrane spontaneously thins down to an approximately 50 AA thick BLM. Specific capacitance measurements of these BLMs revealed stability of up to 50 h. >","PeriodicalId":310841,"journal":{"name":"51st Annual Device Research Conference","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"51st Annual Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.1993.1009616","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Summary form only given. Silicon micromachining is used to fabricate reproducible miniature apertures over photosensitive polyimide (PPI) layers (septa), with highly controllable dimensions. PPI, having a high level of planarization, chemical inertness, a low dielectric constant, and good mechanical strength, is a very suitable material to be used as BLM septa. Apertures of approximately 5 mu m thickness and approximately 40 mu m diameter in PPI septa suspended over thick silicon rims were realized. The fabrication process includes double-side oxide growth on the wafer, spin-coating the PPI and its patterning, back surface anisotropic window etching, and a final cleaning step. Apertures with high circular symmetry were fabricated using this process. The BLM is formed by dropping a small amount of phospholipid-alkane solution over the PPI aperture. An initially few- mu m-thick membrane spontaneously thins down to an approximately 50 AA thick BLM. Specific capacitance measurements of these BLMs revealed stability of up to 50 h. >