The effect of different mechanism on the characteristics of SiC Schottky barrier diode

Yimen Zhang, Yuming Zhang, YueHu Wang, R. Liang
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引用次数: 2

Abstract

A number of experiments demonstrate that the Schottky barrier height for Metal-SiC is different from the prediction of theory. Based on non-uniform barrier height assumption for metal-SiC contact, a numerical simulation with 2D simulator MEDICI is performed in this paper. The simulation results show that present model matches the experimental data very well. Patch defects make the Schottky barrier height decreased. This may give a reasonable explanation for the nonideal behaviors observed from many experiments. The effect of interface state density on Schottky barrier height is also discussed.
不同机制对SiC肖特基势垒二极管特性的影响
大量实验表明,金属-碳化硅的肖特基势垒高度与理论预测不同。本文基于金属-碳化硅接触的非均匀障壁高度假设,利用二维仿真器MEDICI进行了数值模拟。仿真结果表明,该模型与实验数据吻合较好。贴片缺陷使肖特基势垒高度降低。这可以合理地解释从许多实验中观察到的非理想行为。讨论了界面态密度对肖特基势垒高度的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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