A low power and radiation-tolerant FPGA implemented in FD SOI process

Lihua Wu, Guoquan Zhang, Yan Zhao, Xiaowei Han, Bo Yang, Jianzhong Li, Jian Wang, Jiantou Gao, K. Zhao, Ning Li, Fang Yu, Zhong-li Liu
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引用次数: 3

Abstract

A 330,000 gate field programmable gate array (FPGA) VS12C fabricated on 0.2μm full-depletion silicon-on-insulator (FD SOI) process is presented and the test results indicate this chip has the lower power and higher tolerance to radiation compared with Xilinx radiation-hardened XQVR300 chip implemented on 0.22μm epitaxial silicon. This paper demonstrates the benefit of the FD SOI technology on low power and radiation-tolerant FPGA circuit design.
一种低功耗、耐辐射的FPGA实现FD SOI工艺
提出了一种采用0.2μm全损耗绝缘体上硅(FD SOI)工艺制作的33万栅极现场可编程门阵列(FPGA) VS12C芯片,测试结果表明,与采用0.22μm外延硅制作的赛灵思抗辐射XQVR300芯片相比,该芯片具有更低的功耗和更高的抗辐射能力。本文论证了FD SOI技术在低功耗、耐辐射FPGA电路设计中的优势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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