{"title":"Approach of various polymers to 157 nm single-layer resists","authors":"S. Kishimura, M. Sasago, M. Shirai, M. Tsunooka","doi":"10.1109/IMNC.2000.872644","DOIUrl":null,"url":null,"abstract":"Vacuum ultraviolet (VUV) lithography using the F/sub 2/ excimer laser (157 nm) has been proposed as the most promising candidates for 100-70 nm rule device. We have investigated the transparency and photochemical reaction of well-known polymers and resists in VUV region. In this study, we report the F/sub 2/ excimer laser exposure characteristics of resists consisting of various polymers for KrF and ArF resists.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872644","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Vacuum ultraviolet (VUV) lithography using the F/sub 2/ excimer laser (157 nm) has been proposed as the most promising candidates for 100-70 nm rule device. We have investigated the transparency and photochemical reaction of well-known polymers and resists in VUV region. In this study, we report the F/sub 2/ excimer laser exposure characteristics of resists consisting of various polymers for KrF and ArF resists.