RF power potential of 45 nm CMOS technology

U. Gogineni, Jesus A. del Alamo, Christopher S. Putnam
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引用次数: 30

Abstract

This paper presents the first measurements of the RF power performance of 45 nm CMOS devices with varying device widths and layouts. We find that 45 nm CMOS can deliver a peak output power density of around 140 mW/mm with a peak power-added efficiency (PAE) of 70% at 1.1 V. The PAE and Pout decrease with increasing device width because of a decrease in the maximum oscillation frequency (fmax) for large width devices. The PAE also decreases with increasing frequency because of a decrease in gain as the operating frequency approaches fmax. The RF power performance of 45 nm devices is shown to be very similar to that of 65 nm devices.
45纳米CMOS技术的射频功率潜力
本文首次测量了45纳米CMOS器件在不同器件宽度和布局下的射频功率性能。我们发现,在1.1 V电压下,45 nm CMOS可以提供约140 mW/mm的峰值输出功率密度,峰值功率附加效率(PAE)为70%。由于大宽度器件的最大振荡频率(fmax)降低,PAE和Pout随器件宽度的增加而减小。当工作频率接近fmax时,由于增益降低,PAE也随着频率的增加而降低。45纳米器件的射频功率性能与65纳米器件非常相似。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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