Characterisation of bulk GaSb using TCAD

F. Ali, Priyabrata Pattanaik, S. K. Kamilla
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引用次数: 1

Abstract

The III–V compounds have turned out to be promising candidates for high speed electronics and photonic devices. Among III–V compounds, gallium antimonide (GaSb) is particularly interesting as a substrate material because its lattice parameter matches solid solutions of various ternary and quaternary III–V compounds whose band gaps cover a wide spectral range. These have stimulated a lot of interest in GaSb for basic research in materials as well as device fabrication. In this paper, investigation is done for the hole transport property of bulk GaSb with intrinsic concentration 1.5×1015 cm−3. Hole concentration and mobility of bulk GaSb were investigated by simulation method using the device simulation software ATLAS (SILVACO) in the temperature range from 77K to 320K in an interval of 5Kand 10K. It also shows that the effective hole mobility is about 461 cm2/Vs with the concentration ≈ 1.5 × 1015 cm−3 at room temperature i.e. 300K. It has been found that the effective mobility is affected by ionized impurity scattering; in contrast at higher temperatures (≈ 300K) acoustic, polar optical and non-polar optical scattering processes dominate the mobility. The agreement of simulated data with that of reported experimental data is found to be satisfactory.
用TCAD表征大块GaSb
III-V化合物已被证明是高速电子和光子器件的有希望的候选者。在III-V化合物中,锑化镓(GaSb)作为衬底材料特别有趣,因为它的晶格参数与各种三元和四元III-V化合物的固溶体相匹配,这些化合物的带隙覆盖了很宽的光谱范围。这些都激发了人们对GaSb在材料和设备制造方面的基础研究的极大兴趣。本文研究了本征浓度为1.5×1015 cm−3的块状GaSb的空穴输运性质。采用器件仿真软件ATLAS (SILVACO),在77K ~ 320K的温度范围内,以5k和10K为间隔,采用仿真方法研究了块体GaSb的空穴浓度和迁移率。在室温300K条件下,当浓度≈1.5 × 1015 cm−3时,有效空穴迁移率约为461 cm2/Vs。发现离子杂质散射对有效迁移率有影响;相比之下,在较高温度(≈300K)下,声学、极性光学和非极性光学散射过程主导了迁移率。模拟结果与实验结果吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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