Performance investigation of Negative Capacitance Germanium Double Gate-pFET (NCGe-DG-pFET) for improved analog applications

Monika Bansal, H. Kaur
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引用次数: 2

Abstract

In the present work, a drain current model for novel device Negative Capacitance Germanium Double Gate p-type Field Effect Transistor (NCGe-DG-pFET) has been proposed by using Poisson's equation and Landau-Khalatnikov equation. In order to assess the efficacy of proposed device for sharp switching characteristics and low voltage/low power analog applications, electrical characteristics of the proposed device such as gate capacitance, subthreshold swing and drain current have been obtained and studied for a wide range of device parameters and bias conditions. By comparing the characteristics of the proposed device with conventional Germanium Double Gate p-type Field Effect Transistor (Ge-DG-pFET), it is demonstrated that proposed device exhibits enhanced gate controllability, improved current drivability and sub-60 mV/dec subthreshold swing (SS) so it is suitable for analog applications.
用于改进模拟应用的负电容锗双栅极pfet (NCGe-DG-pFET)性能研究
本文利用泊松方程和朗道-卡拉尼科夫方程,建立了新型负电容锗双栅p型场效应晶体管(ncge - dg - pet)的漏极电流模型。为了评估所提出的器件在快速开关特性和低电压/低功率模拟应用中的有效性,在广泛的器件参数和偏置条件下,获得并研究了所提出器件的栅极电容、亚阈值摆幅和漏极电流等电气特性。通过与传统锗双栅p型场效应晶体管(ge - dg - fet)的特性比较,表明该器件具有增强的栅极可控性,改善的电流驱动性和低于60 mV/dec的亚阈值摆幅(SS),因此适用于模拟应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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