Ion implanted InP and InGaAs for ultrafast optoelectronic applications

Abstract

Even though low-temperature growth allows one to obtain InP and InGaAs layers with short electron lifetimes, these layers are hardly applicable for ultrafast optoelectronic devices because of the low resistivity. Therefore, to produce layers with ultrashort carrier lifetimes and high resistivity, other methods should be employed. Here we explore an alternative technique, namely, heavy ion implantation, which has proved to be a viable alternative to the LT growth, at least in the case of GaAs.