Embedded Microchannel Cooling for High Power-Density GaN-on-Si Power Integrated Circuits

R. V. Erp, G. Kampitsis, L. Nela, R. Ardebili, E. Matioli
{"title":"Embedded Microchannel Cooling for High Power-Density GaN-on-Si Power Integrated Circuits","authors":"R. V. Erp, G. Kampitsis, L. Nela, R. Ardebili, E. Matioli","doi":"10.1109/ITherm45881.2020.9190356","DOIUrl":null,"url":null,"abstract":"In this work, we demonstrate a new thermal management approach for direct cooling of GaN-on-Si power integrated circuits (ICs), in which the Si substrate functions as a microfluidic heat sink, turning Si into a cost-effective, high thermal performance substrate. Flowing coolant through microchannels etched in the backside of the substrate enables a much denser integration of GaN power devices in a single chip. As a proof of concept, an integrated full-wave bridge rectifier (FWBR) was realized based on high-performance tri-anode GaN Schottky barrier diodes (SBDs), together with a novel hybrid printed circuit board (PCB) that provides fluidic and electric connections to the liquid-cooled power IC. A device-level heat flux of 417 W/cm2 was cooled using only 60 mW of pumping power. Compared to natural-convection air-cooling, the temperature rise was reduced by 98% and the converter output power was increased by 30 times, up to 120 W, by eliminating self-heating degradation. The high cooling efficiency, large heat extraction capabilities and low-cost fabrication process of embedded microchannels on GaN-on-Si, in combination with new PCB-based coolant delivery, can be an enabling technology for the next generation of ultra-high power-density ICs.","PeriodicalId":193052,"journal":{"name":"2020 19th IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (ITherm)","volume":"57 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 19th IEEE Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems (ITherm)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ITherm45881.2020.9190356","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

Abstract

In this work, we demonstrate a new thermal management approach for direct cooling of GaN-on-Si power integrated circuits (ICs), in which the Si substrate functions as a microfluidic heat sink, turning Si into a cost-effective, high thermal performance substrate. Flowing coolant through microchannels etched in the backside of the substrate enables a much denser integration of GaN power devices in a single chip. As a proof of concept, an integrated full-wave bridge rectifier (FWBR) was realized based on high-performance tri-anode GaN Schottky barrier diodes (SBDs), together with a novel hybrid printed circuit board (PCB) that provides fluidic and electric connections to the liquid-cooled power IC. A device-level heat flux of 417 W/cm2 was cooled using only 60 mW of pumping power. Compared to natural-convection air-cooling, the temperature rise was reduced by 98% and the converter output power was increased by 30 times, up to 120 W, by eliminating self-heating degradation. The high cooling efficiency, large heat extraction capabilities and low-cost fabrication process of embedded microchannels on GaN-on-Si, in combination with new PCB-based coolant delivery, can be an enabling technology for the next generation of ultra-high power-density ICs.
高功率密度GaN-on-Si功率集成电路的嵌入式微通道散热
在这项工作中,我们展示了一种新的热管理方法,用于直接冷却GaN-on-Si功率集成电路(ic),其中Si衬底作为微流体散热器,将Si变成具有成本效益,高热性能的衬底。流动冷却剂通过蚀刻在衬底背面的微通道,使GaN功率器件在单个芯片中的集成更加密集。作为概念验证,基于高性能三阳极GaN肖特基势垒二极管(sbd)实现了集成全波桥式整流器(FWBR),以及一种新型混合印刷电路板(PCB),为液冷电源IC提供流体和电气连接。仅使用60兆瓦的泵浦功率就可以冷却417 W/cm2的器件级热流密度。与自然对流空冷相比,通过消除自热退化,温度升高降低了98%,变流器输出功率提高了30倍,达到120 W。GaN-on-Si上嵌入式微通道的高冷却效率、大热量提取能力和低成本制造工艺,加上新的基于pcb的冷却剂输送,可以成为下一代超高功率密度集成电路的使能技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信