Low-area 1-kb multi-bit OTP IP design

Liyan Jin, Tae-Hoon Kim, Cheon-Hyo Lee, P. Ha, Young-Hee Kim
{"title":"Low-area 1-kb multi-bit OTP IP design","authors":"Liyan Jin, Tae-Hoon Kim, Cheon-Hyo Lee, P. Ha, Young-Hee Kim","doi":"10.1109/ASICON.2009.5351324","DOIUrl":null,"url":null,"abstract":"In this paper 1-kb multi-bit OTP IP, which is non-volatile memory, is designed for a power management IC. A conventional multi-bit OTP cell uses isolated NMOS transistor, but the cell size is large in the BCD process. So, PMOS transistor is used instead of the isolated NMOS transistor as antifuse, and the cell size is minimized by optimizing the size of PMOS transistor. In addition, an ESD protection circuit is added to prevent the case that any cell is programmed by high voltage at ESD test. The 1kb OTP IP is designed using Dongbu's 0.18µm BCD process and the layout size of the IP is 160.490 × 506.255 µm 21.","PeriodicalId":446584,"journal":{"name":"2009 IEEE 8th International Conference on ASIC","volume":"98 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE 8th International Conference on ASIC","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASICON.2009.5351324","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this paper 1-kb multi-bit OTP IP, which is non-volatile memory, is designed for a power management IC. A conventional multi-bit OTP cell uses isolated NMOS transistor, but the cell size is large in the BCD process. So, PMOS transistor is used instead of the isolated NMOS transistor as antifuse, and the cell size is minimized by optimizing the size of PMOS transistor. In addition, an ESD protection circuit is added to prevent the case that any cell is programmed by high voltage at ESD test. The 1kb OTP IP is designed using Dongbu's 0.18µm BCD process and the layout size of the IP is 160.490 × 506.255 µm 21.
低区域1kb多比特OTP IP设计
本文设计了一种用于电源管理IC的1kb多比特OTP IP,即非易失性存储器。传统的多比特OTP单元使用隔离的NMOS晶体管,但在BCD过程中单元尺寸较大。因此,采用PMOS晶体管代替隔离型NMOS晶体管作为防熔丝,并通过优化PMOS晶体管的尺寸,使电池尺寸最小化。此外,还增加了ESD保护电路,以防止任何电池在ESD测试时被高电压编程。1kb OTP IP采用东部大学的0.18µm BCD工艺设计,IP的布局尺寸为160.490 × 506.255µm 21。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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