Simulation and analysis of 980nm intracavity-contacted VCSEL

L. Wan, Yuan Feng, Peng Xu, G. Jin, Ying-jie Zhao, Yusi Zhao
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Abstract

In this paper, optical and electrical properties of the traditional and intracavity-contacted structures of 980nm VCSELs were simulated in the case of the same epitaxial growth by Crosslight PICS3D. Threshold current of the traditional structure device was 8.76mA and the one of intracavity-contacted structure device was 6.23mA. When operating current was 25 mA, the output power of the traditional structure device was 5.6mW and the one of intracavity-contacted structure device was 7mW. Compared with the traditional structure, the threshold current of intracavity-contacted structure device was reduced by 2.53mA, the output power was increased to 1.25 times, optical and electrical properties of the device were improved.
980nm腔内接触VCSEL仿真与分析
本文利用交叉微距PICS3D模拟了980nm VCSELs在相同外延生长条件下的传统结构和腔内接触结构的光学和电学性质。传统结构装置的阈值电流为8.76mA,腔内接触结构装置的阈值电流为6.23mA。当工作电流为25 mA时,传统结构装置的输出功率为5.6mW,腔内接触结构装置的输出功率为7mW。与传统结构相比,腔内接触结构器件的阈值电流降低了2.53mA,输出功率提高到1.25倍,器件的光学和电学性能得到改善。
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