X-ray and EUV liquid-jet-target laser-plasma sources based on solutions and cryogenic liquids

Abstract

Here we report on new experiments, extending the laser produced plasma source's applicability for lithography by producing liquid-jet targets of substances that are gases or solids at normal pressure and temperature. This development is important since new wavelength ranges become accessible. Furthermore, the possibility to chose high-Z target material should lead to higher conversion efficiencies.