Field emission from nano-protrusion fabricated using nano-stamp technique

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984157

A. Baba, K. Tsubaki, T. Asano

引用次数: 0

Abstract

In this paper, we report the fabrication of aligned nano-protrusion using a nano-stamp technique. The field emission characteristic from the nano-protrusion array also reports.

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利用纳米印记技术制备纳米突起的场发射

在本文中，我们报道了利用纳米印记技术制造对准纳米突起。本文还报道了纳米突出阵列的场发射特性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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