Enhanced design performance thanks to adaptative body biasing technique in FDSOI technolologies

F. Arnaud, S. Clerc, S. Haendler, R. Bingert, P. Flatresse, V. Huard, T. Poiroux
{"title":"Enhanced design performance thanks to adaptative body biasing technique in FDSOI technolologies","authors":"F. Arnaud, S. Clerc, S. Haendler, R. Bingert, P. Flatresse, V. Huard, T. Poiroux","doi":"10.1109/S3S.2017.8308754","DOIUrl":null,"url":null,"abstract":"This paper presents a comprehensive analysis of Adaptive Body Bias (ABB) interests provided by Fully Depleted Silicon On Insulator (FDSOI) technology. At transistor level, we demonstrate a total process variability and temperature effect compensation thanks reverse and forward bias. Those benefits have been reached without degradation of devices reliability versus regular Adaptative Voltage Scaling solution (AVS). Leveraging this triple advantages (variability, temperature and ageing), digital design density is discussed showing significant reduction of W/L metric in case of ABB usage in CPU core. Forward Body Biasing (FBB) exhibited significant analog performance increasing (+100%) on key parameters such as gm and gd for both I/Os and core oxide devices. Finally, outstanding Vmin yield improvement thanks to ABB technique is demonstrated on commercial product in the automotive market.","PeriodicalId":333587,"journal":{"name":"2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"119 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2017.8308754","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

This paper presents a comprehensive analysis of Adaptive Body Bias (ABB) interests provided by Fully Depleted Silicon On Insulator (FDSOI) technology. At transistor level, we demonstrate a total process variability and temperature effect compensation thanks reverse and forward bias. Those benefits have been reached without degradation of devices reliability versus regular Adaptative Voltage Scaling solution (AVS). Leveraging this triple advantages (variability, temperature and ageing), digital design density is discussed showing significant reduction of W/L metric in case of ABB usage in CPU core. Forward Body Biasing (FBB) exhibited significant analog performance increasing (+100%) on key parameters such as gm and gd for both I/Os and core oxide devices. Finally, outstanding Vmin yield improvement thanks to ABB technique is demonstrated on commercial product in the automotive market.
FDSOI技术中的自适应体偏置技术提高了设计性能
本文综合分析了全贫绝缘体上硅(FDSOI)技术带来的自适应体偏(ABB)利益。在晶体管水平,我们展示了一个总的过程可变性和温度效应补偿由于反向和正向偏置。与常规的自适应电压缩放解决方案(AVS)相比,这些优点在不降低设备可靠性的情况下得到了实现。利用这三重优势(可变性、温度和老化),讨论了数字设计密度,在ABB在CPU核心中使用的情况下,显示了W/L度量的显着降低。前向体偏置(FBB)在I/ o和核心氧化物器件的关键参数(如gm和gd)上表现出显著的模拟性能提高(+100%)。最后,在汽车市场的商业产品上展示了ABB技术对Vmin良率的显著改善。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信