PLEDs for Integration with MOS Circuits

L. Heinrich, J. Horstmann, K. Goser
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Abstract

A new promising way for the monolithic integration of light emitting devices on the top of MOS circuits is discribed. The active layer consists of PPV or MeLPPP light emitting polymer material (LEP) with an ITO cathode and a metallic anode. All process steps, including the possibility of dry etching of the active layer and structuration of the upper electrode, are typical for MOS-technology. Currentvoltage and current-intensity measurements of the devices are done for characterisation. These polymeric light emitting diodes (PLED) allow the monolithic integration of MOS microelectronic circuits and light emitting devices on a silicon chip forming one
用于与MOS电路集成的led
提出了在MOS电路上单片集成发光器件的新途径。活性层由具有ITO阴极和金属阳极的PPV或MeLPPP发光聚合物材料(LEP)组成。所有的工艺步骤,包括干法蚀刻有源层的可能性和上电极的结构,都是典型的mos技术。器件的电流电压和电流强度测量是为了进行表征。这些聚合物发光二极管(PLED)允许MOS微电子电路和发光器件在硅片上形成一个单片集成
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