A robust array architecture for a capacitorless MISS tunnel-diode memory

S. Hanzawa, T. Sakata, T. Sekiguchi, H. Matsuoka
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引用次数: 1

Abstract

With the aim of applying a MISS tunnel-diode cell to a high-density RAM, we studied its problems and developed three circuit techniques to solve them. The first, a hierarchical bit-line structure increases the number of memory cells in a bit-line and reduces the number of sense amplifiers. The second, a twin-dummy-cell technique generates a proper reference signal to discriminate read currents. The third, a standby-voltage control scheme reduces background currents and suppresses the degeneration of the signal current. These techniques enable a high-density RAM to use the capacitorless MISS-diode memory cell, whose effective cell area is 6F/sup 2/ (F: minimum feature size). The third technique increases the signal current from 0.25 to 0.85 compared to the original one.
一种用于无电容MISS隧道二极管存储器的鲁棒阵列结构
为了将MISS隧道二极管电池应用于高密度RAM,我们研究了其存在的问题,并开发了三种电路技术来解决这些问题。首先,分层位线结构增加了位线上存储单元的数量,减少了感测放大器的数量。第二,双假单元技术产生适当的参考信号来区分读电流。第三,备用电压控制方案降低了背景电流,抑制了信号电流的退化。这些技术使高密度RAM能够使用无电容miss二极管存储单元,其有效单元面积为6F/sup 2/ (F:最小特征尺寸)。第三种技术将信号电流从原来的0.25增加到0.85。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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