Optimization of electron beam dose for reliable nanoscale growth template formation in electron beam lithography system

Abstract

Dose optimization of electron beam has been performed for transferring nano-dimension patterns by employing electron beam lithography. An extensive study has been conducted for optimizing lithographic features with e-beam resist PMMA of different thicknesses. It has been possible to obtain sub-80 nm circular dot patterns with good resolution and high aspect ratio. Au template has been developed by employing lift-off technique for subsequent nanostructure growth employing VLS method. TiO2 nanoislands have been grown on patterned Au template and its crystallographic nature has been studied by using X-ray diffraction measurement. The grown nanoislands showed perfect hexagonal facets.