{"title":"Sub-100 nm lithography using KrF exposure with multiple development method","authors":"M. Asano","doi":"10.1109/IMNC.1999.797523","DOIUrl":null,"url":null,"abstract":"Describes a novel resist process technique, using a chemically amplified resist with a multiple development method for improving resolution of photolithography. By means of this technique, a grating resist pattern whose frequency is more than a cutoff frequency of the optics (vc=1/Pc=2NA//spl lambda/) can be delineated using a conventional exposure system. This process uses a resist that allows either positive or negative imaging depending on the selection of a developer solvent.","PeriodicalId":120440,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1999.797523","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Describes a novel resist process technique, using a chemically amplified resist with a multiple development method for improving resolution of photolithography. By means of this technique, a grating resist pattern whose frequency is more than a cutoff frequency of the optics (vc=1/Pc=2NA//spl lambda/) can be delineated using a conventional exposure system. This process uses a resist that allows either positive or negative imaging depending on the selection of a developer solvent.