3D modeling of contact material deposition and its impact on equipment design parameters

Abstract

We report the first full 3D simulations of conventional and collimated sputter deposition into high aspect ratio windows and vias, which accurately reproduce all features of experimental data. First, a 3D Monte Carlo approach is employed to simulate the microscopic structure of the films and the evolution of the topography during deposition. Second, a 3D geometric calculation investigates how macroscopic effects (film thicknesses under the collimator, shadowing, collimator transmission) vary with collimation parameters, such as grid size and position. The results are used to determine optimum equipment design.<>