{"title":"The effect of the doping concentration on nanoscale field effect diode performance","authors":"N. Manavizadeh, F. Raissi, E. Soleimani","doi":"10.1109/ULIS.2011.5757992","DOIUrl":null,"url":null,"abstract":"The performance of nanoscale Field Effect Diode as a function of doping concentration is investigated. Our numerical results show that the I<inf>on</inf>/I<inf>off</inf> ratio which is a significant parameter in digital application can be varied from 10<sup>1</sup> to 10<sup>4</sup> as the doping concentration of source/drain regions increased from 10<sup>16</sup> to 10<sup>21</sup> cm<sup>−3</sup>. The figures of merit including intrinsic gate delay time and energy-delay product have been studied for the field effect diodes which are interesting candidates for future logic application.","PeriodicalId":146779,"journal":{"name":"Ulis 2011 Ultimate Integration on Silicon","volume":"289 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-03-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ulis 2011 Ultimate Integration on Silicon","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2011.5757992","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
The performance of nanoscale Field Effect Diode as a function of doping concentration is investigated. Our numerical results show that the Ion/Ioff ratio which is a significant parameter in digital application can be varied from 101 to 104 as the doping concentration of source/drain regions increased from 1016 to 1021 cm−3. The figures of merit including intrinsic gate delay time and energy-delay product have been studied for the field effect diodes which are interesting candidates for future logic application.
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