InGaAs inversion layers band structure, electrostatics, and mobility modeling based on 8 Band k · p theory

A. Pham, Seonghoon Jin, W. Choi, M. J. Lee, S. Cho, Y.-T. Kim, K. Lee, Y. Park
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Abstract

8 band k · p method is used to calculate subband structures of InGaAs inversion layers accounting for strong coupling between conduction and valence bands around Γ point as well as quantum confinement. Inversion layer mobility is computed employing Kubo-Greenwood formalism. Scatterings due to acoustic phonons, polar optical phonons, ionized impurities, interface fixed charges, surface roughness, and alloy disorder are included. The simulated low-field electron mobility results are in good agreement with in-house experimental data with and without an InP capping layer.
基于8波段k·p理论的InGaAs逆温层能带结构、静电学和迁移率建模
采用8波段k·p方法计算了InGaAs反转层的子带结构,考虑了Γ点附近导价带之间的强耦合以及量子约束。采用Kubo-Greenwood形式计算逆温层迁移率。包括声子、极性光学声子、电离杂质、界面固定电荷、表面粗糙度和合金无序引起的散射。模拟的低场电子迁移率结果与内部实验数据很好地吻合,无论是否有InP盖层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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