AlInN as high-index-contrast material for GaN-based optoelectronics

J. Carlin, J. Dorsaz, C. Zellweger, S. Gradečak, M. Ilegems
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Abstract

High crystalline quality AlInN was grown near lattice-matched to GaN. It shows /spl ap/7% index contrast with GaN. It is thus a promising alternative to AlGaN, as demonstrated by a 20-pairs AlInN/GaN DBR with over 90% reflectivity.
作为氮化镓基光电器件的高折射率对比材料
高结晶质量的AlInN生长在晶格匹配GaN附近。它显示了与GaN的/spl / ap/7%指数对比。因此,它是一种很有希望的AlGaN替代品,正如20对AlInN/GaN DBR所证明的那样,反射率超过90%。
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