Stability/performance assessment of monolithic 3D 6T/8T SRAM cells considering transistor-level interlayer coupling

M. Fan, V. Hu, Yin-Nien Chen, P. Su, C. Chuang
{"title":"Stability/performance assessment of monolithic 3D 6T/8T SRAM cells considering transistor-level interlayer coupling","authors":"M. Fan, V. Hu, Yin-Nien Chen, P. Su, C. Chuang","doi":"10.1109/VLSI-TSA.2014.6839680","DOIUrl":null,"url":null,"abstract":"In this work, we investigate the impact of interlayer coupling on monolithic 3D 6T/8T SRAM cells with various layouts and tier combinations. Our results indicate that for 3D 6T SRAM cell with NFET in top layer, aligning upper-tier pull-down NFET with bottom-tier pull-up PFET enables better cell stability. For monolithic 3D 8T cell, an area-efficient 4N4P design is evaluated with optimized two-tier layout to enhance cell performance. We find that stacking NFET layer over the PFET tier results in larger design margins for SRAM cell stability and performance.","PeriodicalId":403085,"journal":{"name":"Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"119 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2014.6839680","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this work, we investigate the impact of interlayer coupling on monolithic 3D 6T/8T SRAM cells with various layouts and tier combinations. Our results indicate that for 3D 6T SRAM cell with NFET in top layer, aligning upper-tier pull-down NFET with bottom-tier pull-up PFET enables better cell stability. For monolithic 3D 8T cell, an area-efficient 4N4P design is evaluated with optimized two-tier layout to enhance cell performance. We find that stacking NFET layer over the PFET tier results in larger design margins for SRAM cell stability and performance.
考虑晶体管级层间耦合的单片3D 6T/8T SRAM单元的稳定性/性能评估
在这项工作中,我们研究了层间耦合对具有不同布局和层组合的单片3D 6T/8T SRAM单元的影响。我们的研究结果表明,对于顶层具有nfiet的3D 6T SRAM电池,将上层下拉nfiet与底层上拉pfiet对齐可以提高电池的稳定性。对于单片3D 8T电池,通过优化两层布局来评估面积高效的4N4P设计,以提高电池性能。我们发现,在fet层上堆叠fet层可以为SRAM单元的稳定性和性能带来更大的设计余量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信