{"title":"Yield enhancement using a memory expert system linked to the wafer inspection tool","authors":"M. Sugimoto, H. Hamada","doi":"10.1109/ASMC.1995.484387","DOIUrl":null,"url":null,"abstract":"This paper describes a memory yield enhancement system that allows rapid determination of problematic wafer processing steps during mass production. Previously, we had developed an expert system that, in addition to generating the defect statistics, can quickly predict a fault's cause as well as the processing step with the high probability of being responsible for the cause with 40 seconds for a 16 M DRAM. The system discussed in this paper combines our expert system with a conventional, stand-alone cell-to-cell comparison-based wafer inspection tool via an innovative software link. Comparison of wafer mappings, produced independently by the expert system and the wafer inspection tool, enables fast confirmation of the expert system's predictions. As a result, a production engineer can quickly recognize the corrective action to take to prevent the recurrence of the defect for the process step concerned. Use of this system has allowed quick identification of the cause of actual low yield circumstances.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"174 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484387","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
This paper describes a memory yield enhancement system that allows rapid determination of problematic wafer processing steps during mass production. Previously, we had developed an expert system that, in addition to generating the defect statistics, can quickly predict a fault's cause as well as the processing step with the high probability of being responsible for the cause with 40 seconds for a 16 M DRAM. The system discussed in this paper combines our expert system with a conventional, stand-alone cell-to-cell comparison-based wafer inspection tool via an innovative software link. Comparison of wafer mappings, produced independently by the expert system and the wafer inspection tool, enables fast confirmation of the expert system's predictions. As a result, a production engineer can quickly recognize the corrective action to take to prevent the recurrence of the defect for the process step concerned. Use of this system has allowed quick identification of the cause of actual low yield circumstances.
本文描述了一种存储器良率增强系统,该系统可以在批量生产过程中快速确定有问题的晶圆加工步骤。以前,我们开发了一个专家系统,除了生成缺陷统计数据外,还可以快速预测故障原因以及处理步骤,对于16 M DRAM,只需40秒就可以对原因负责。本文讨论的系统通过创新的软件链接将我们的专家系统与传统的、独立的基于单元间比较的晶圆检测工具相结合。由专家系统和晶圆检测工具独立生成的晶圆映射的比较,可以快速确认专家系统的预测。因此,生产工程师可以快速识别纠正措施,以防止有关工艺步骤的缺陷再次发生。使用该系统可以快速识别实际低产量情况的原因。