Electron ballistic current enhancement of Ge1−xSnx FinFETs

H. Lan, C. W. Liu
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Abstract

The indirect-direct transition of Ge1-xSnx at Sn content 6.5% is simulated by nonlocal empirical pseudopotential method. The non-parabolicity band of Γ valley is considered for confined mass, density of state, and conductivity mass for the electron ballistic current calculation of Ge1-xSnx FinFETs. The integration of alloying Sn content and applying external stress enhances the ballistic current due to carriers transferring from indirect L valleys with small injection velocity to direct Γ valley and other indirect L valleys with high injection velocity.
Ge1−xSnx finfet的电子弹道电流增强
用非局域经验赝势法模拟了Sn含量为6.5%时Ge1-xSnx的间接直接跃迁过程。在计算Ge1-xSnx finfet的电子弹道电流时,考虑了Γ谷的非抛物线带的约束质量、态密度和电导率质量。由于载流子从小注入速度的间接L谷向直接Γ谷和其他高注入速度的间接L谷转移,使Sn含量合金化和施加外应力的结合增强了弹道电流。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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