A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential

Abstract

This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.