Reliability characterization of a commercial TaOx-based ReRAM

Yang-Scharlotta Jean, Megan Fazio, Mehran Amrbar, M. White, D. Sheldon
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引用次数: 3

Abstract

We present results of endurance and retention characterization for one of the first commercially available TaOx-based resistive memory chip in room and higher temperature environments. Data retention of the memory chip shows activation energy of 1.13eV and demonstrates an 85°C 10-year data retention even after 250,000 programming cycles. The combined program and read errors were in the range of 10-7 to 10-5 and the memory chip withstood 106 program cycles at 125°C. Overall, the reliability of this commercial resistive memory chip compares well with flash memory.
基于陶克斯的商用ReRAM的可靠性特性
我们介绍了在室温和高温环境下第一个商用的基于陶氧的电阻式存储芯片的耐久性和保留特性的结果。存储芯片的数据保留显示活化能为1.13eV,即使在250,000个编程周期后也能保持85°C 10年的数据保留。编程和读取的综合误差在10-7到10-5之间,存储芯片在125°C下可承受106个编程周期。总的来说,这种商用电阻存储器芯片的可靠性与闪存相比要好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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