P. Royannez, H. Mair, F. Dahan, M. Wagner, M. Streeter, L. Bouetel, J. Blasquez, H. Clasen, G. Semino, J. Dong, D. Scott, B. Pitts, C. Raibaut, U. Ko
{"title":"Leakage Power Reduction Techniques applied to 90-nm SoC Application Processor","authors":"P. Royannez, H. Mair, F. Dahan, M. Wagner, M. Streeter, L. Bouetel, J. Blasquez, H. Clasen, G. Semino, J. Dong, D. Scott, B. Pitts, C. Raibaut, U. Ko","doi":"10.1109/ICICDT.2006.220781","DOIUrl":null,"url":null,"abstract":"At the 90-nm, leakage currents bring standby power to an unacceptable level and circuit level techniques become mandatory. However applying these techniques must be robust and practical. In this paper we focus not only on leakage reduction solutions but also on their deployment as a worldwide infrastructure as the added-value resides not only in the techniques themselves but also in the way they are implemented to build an efficient, re-usable, robust, low cost and portable platform. Techniques have been silicon proven on the 90-nm TI CMOS technology and is commonly used to design SoC with complexities over 100 million transistors","PeriodicalId":447050,"journal":{"name":"2006 IEEE International Conference on IC Design and Technology","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-08-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Conference on IC Design and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2006.220781","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
At the 90-nm, leakage currents bring standby power to an unacceptable level and circuit level techniques become mandatory. However applying these techniques must be robust and practical. In this paper we focus not only on leakage reduction solutions but also on their deployment as a worldwide infrastructure as the added-value resides not only in the techniques themselves but also in the way they are implemented to build an efficient, re-usable, robust, low cost and portable platform. Techniques have been silicon proven on the 90-nm TI CMOS technology and is commonly used to design SoC with complexities over 100 million transistors