Influence of PH3 flow distribution on the growth of AlInP/GaInP distributed Bragg-reflector

Abstract

AlInP/GaInP distributed Bragg-reflector (DBRs) were prepared by MOCVD. Influences of the flow velocity and rate of mixed gas on homogeneity of epitaxial film were investigated systematically. Compared with the change of single group V source, the uniformity of AlInP/GaInP layers was significantly improved by changing simultaneously the distribution of upper and lower nozzle group in the fixed V/III ratio.