Improved Emission Wavelength Reproducibiliy of InP-Based All Movpe Grown 1.55 μm Quantum Dot Lasers

D. Franke, P. Harde, J. Boettcher, M. Moehrle, A. Sigmund, H. Kuenzel
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引用次数: 5

Abstract

InAs quantum dots (QD) on InP emitting at 1.55 μm grown by using conventional MOVPE sources were investigated. Aiming at their implementation in 1.55 μm laser structures thermal stability of the QDs during growth of the upper cladding layer was found to be a severe problem most probably due to movement of growth constituents resulting in a marked blue-shift of the emission. This shift was systematically investigated using thermal treatment to simulate cladding growth. The strong dependence of the blue-shift on growth temperature (Tg) of the QDs is believed to be due to defects being incorporated during GalnAsP matrix deposition. The cause for the defects is assumed to be incomplete decomposition of the PH3 or reduced surface diffusion length at low Tg which support interdiffusion. Above Tg = 510°C stable emission from the QDs independent of regrowth temperature in this range was observed. Application of a QD deposition temperature of 500°C results in laser structures with a QD density of 5-1010 cm-2. Excellent laser material quality characterized by Jth ≪ 100 A/cm2 per QD layer was achieved.
提高了基于inp的1.55 μm量子点激光器发射波长的再现性
研究了利用传统MOVPE源生长在1.55 μm发光InP上的InAs量子点。针对其在1.55 μm激光结构中的实现,发现在上层熔覆层的生长过程中,量子点的热稳定性是一个严重的问题,这很可能是由于生长成分的移动导致了发射的明显蓝移。利用热处理模拟包层生长,系统地研究了这种转变。蓝移对量子点生长温度(Tg)的强烈依赖被认为是由于在GalnAsP基体沉积过程中加入了缺陷。产生缺陷的原因被认为是PH3的不完全分解或在低Tg下表面扩散长度减少,从而支持相互扩散。在Tg = 510℃以上,在此范围内观察到与再生温度无关的量子点的稳定发射。当QD沉积温度为500°C时,激光结构的QD密度为5-1010 cm-2。实现了每QD层Jth≪100 A/cm2的优异激光材料质量。
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