Characterization and modeling of low-frequency noise in CVD-grown graphene FETs

C. Mukherjee, Jorgue Daniel Aguirre Morales, S. Frégonèse, T. Zimmer, C. Maneux, H. Happy, Wei Wei
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引用次数: 2

Abstract

In this paper, we report the low-frequency noise characterization of CVD -grown Graphene FETs (GFET). Low-frequency measurements indicate a dominant contribution of 1/f noise in the drain current noise source. A quadratic dependence of the drain current-noise on drain current is observed. An overall comparison between different geometries of the two generations of the CVD GFETs is shown in terms of flicker noise levels and impact of access resistances on the noise response. The noise level inversely depends on the graphene area of the GFETs indicating that the locations of the primary noise sources are in the graphene layers. The flicker and Johnson noise sources are introduced in a compact model with DC parameters of the CVD GFET. Results from the noise compact model are validated with the measurement results showing good agreement.
cvd生长的石墨烯fet中低频噪声的表征和建模
在本文中,我们报道了CVD生长的石墨烯场效应管(GFET)的低频噪声特性。低频测量表明漏极电流噪声源中1/f噪声占主导地位。漏极电流-噪声与漏极电流呈二次相关关系。从闪烁噪声水平和接入电阻对噪声响应的影响方面,对两代CVD gfet的不同几何形状进行了全面比较。噪声水平与gfet的石墨烯面积成反比,表明主要噪声源的位置在石墨烯层中。以CVD GFET的直流参数为模型,介绍了闪变和约翰逊噪声源。噪声压缩模型的计算结果与实测结果吻合良好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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