A Fully Integrated CMOS Sensor for Pico-current Measurement on Solid-state Nanopore Devices

Jungsuk Kim, K. Pedrotti, W. Dunbar
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Abstract

In this paper, an integrated high-sensitivity patch-clamp sensor is proposed to measure the ultra-low current variation of a solid-state nanopore device. This sensor amplifier consists of three stages: 1) a headstage, 2) a difference amplifier and 3) a unity-gain buffer. For the headstage, a resistive-feedback transimpedance amplifier is employed to convert the small current to a readable voltage. The addition of a programmable gain to the second-stage difference amplifier allows the maximum gain to be increased to 168dBΩ. This sensor is fabricated in a 0.35μm CMOS process and is tested with an 80nm-diameter solid-state nanopore. We present a detailed circuit analysis for the low-noise patch-clamp design and its noise measurement result in this paper.
一种用于固态纳米孔器件微电流测量的全集成CMOS传感器
本文提出了一种集成式高灵敏度膜片钳传感器,用于测量固态纳米孔器件的超低电流变化。该传感器放大器由三级组成:1)前置级,2)差分放大器和3)单位增益缓冲器。对于前置级,采用电阻反馈跨阻放大器将小电流转换为可读电压。添加一个可编程增益到第二级差分放大器允许最大增益增加到168dBΩ。该传感器采用0.35μm CMOS工艺制作,并在直径为80nm的固态纳米孔上进行了测试。本文给出了低噪声膜片钳设计的详细电路分析及其噪声测量结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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