Electron beam and RF wave interaction mechanism in the reltron oscillator

Manpuran Mahto, P. K. Jain
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Abstract

Reltron is simple, compact and efficient high power microwave source. In this paper, the beam-wave interaction analysis of the reltron device has been explained. To investigate the electron beam and RF wave interaction process, 3D PIC simulation of the device has been carried out in the presence of the electrons emitted through the cathode. For the typical reltron device considered here, the present simulation study predicted a peak RF power of ∼120MW at 2.75 GHz with an electronic efficiency of ∼23% when a beam voltage of 100 kV, post-acceleration voltage of 600 kV and beam current of 750 A are applied. This has been found in the close agreement with the analytical results within ∼4–9%.
电子束与射频波在控管振荡器中的相互作用机理
Reltron是一种简单、紧凑、高效的高功率微波源。本文阐述了控管装置的波束相互作用分析。为了研究电子束和射频波的相互作用过程,在阴极发射电子存在的情况下,对器件进行了三维PIC模拟。对于本文所考虑的典型的控管装置,本仿真研究预测,当束流电压为100 kV,加速后电压为600 kV,束流电流为750 a时,在2.75 GHz处的峰值射频功率为~ 120MW,电子效率为~ 23%。这与分析结果在~ 4-9%的范围内非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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