Study of junctionless pseudo tri-gate vertical MOSFETs for RF/analog applications

Yu-Che Chang, Jyi-Tsong Lin, Y. Eng, Cheng-Hsin Chen, Kuan-Yu Lu, Chih-Hsuan Tai, Yi-Hsuan Fan
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引用次数: 2

Abstract

In this study, junctionless technology employed for fabricating pseudo tri-gate vertical (PTGV) MOSFETs is proposed and the RF/analog performance is also investigated and demonstrated. According to simulation results, the excellent performances such as high transconductance (gm), high cut-off frequency (ƒT), and high transconductance generation factor (gm/Id) are achieved. The numerical results also provide a prediction of an 8nm gate length PTGV and JPTGV for RF applications.
用于射频/模拟应用的无结伪三栅极垂直mosfet的研究
在这项研究中,提出了用于制造伪三栅极垂直(PTGV) mosfet的无结技术,并对其RF/模拟性能进行了研究和演示。仿真结果表明,该电路具有高跨导(gm)、高截止频率(ƒT)和高跨导产生因子(gm/Id)等优异性能。数值结果还提供了用于射频应用的栅极长度为8nm的PTGV和JPTGV的预测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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