Experimental characterization of LIGA fabricated 0.22 THz TWT circuits

2011 IEEE International Vacuum Electronics Conference (IVEC) Pub Date : 2011-02-21 DOI:10.1109/IVEC.2011.5746982

A. Baig, D. Gamzina, Micheal Johnson, C. Domier, A. Spear, L. Barnett, N. Luhmann, Y. Shin

引用次数: 14

Abstract

In this paper we report precision MEMS Fabrication using novel LIGA technique for 0.22 THz micro-metallic staggered double-vane TWT circuits. For this high aspect ratio structure negative tone photo-resist KMPR was used. The entire fabrication process starting from spin coating, UV-lithography, electroforming and mold removal processing was fully characterized. Finally, the high tolerance TWT structure with smoothness (50–80 nm) was aligned in a specially engineered fixture for RF measurements in the BWO range 165–270GHz. The experiment showed excellent transmission 5–8 dB in frequency range 210–265 GHz. This result showed a distinct potential of applying this precision fabrication technique for the mass production of THz sources.

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LIGA制备0.22 THz行波管电路的实验表征

本文报道了利用新型LIGA技术制造0.22太赫兹微金属交错双叶片行波管电路的精密MEMS。对于这种高纵横比结构，采用了负色调光刻胶KMPR。从旋涂、uv光刻、电铸到脱模加工的整个制造过程进行了全面表征。最后，将高容差、平滑度(50-80 nm)的行波管结构在一个专门设计的夹具中对准，用于BWO范围为165-270GHz的射频测量。实验结果表明，在210 ~ 265 GHz频率范围内具有5 ~ 8db的优良传输性能。这一结果显示了将这种精密制造技术应用于大规模生产太赫兹源的明显潜力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2011 IEEE International Vacuum Electronics Conference (IVEC)

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