{"title":"A novel algorithm for the solution of charge transport equations in MANOS devices including charge trapping in alumina and temperature effects","authors":"A. Padovani, L. Larcher","doi":"10.1109/SISPAD.2010.5604519","DOIUrl":null,"url":null,"abstract":"We present a new algorithm for the exact solution of the system of equations describing charge trapping and transport across the dielectric stack of nitride-based charge trapping memories. The algorithm is implemented in a physical MANOS model accounting for temperature effects and charge trapping into the Al2O3 blocking layer. The model reproduces threshold voltage shifts measured at different temperatures on different MANOS stacks.","PeriodicalId":331098,"journal":{"name":"2010 International Conference on Simulation of Semiconductor Processes and Devices","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2010.5604519","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
We present a new algorithm for the exact solution of the system of equations describing charge trapping and transport across the dielectric stack of nitride-based charge trapping memories. The algorithm is implemented in a physical MANOS model accounting for temperature effects and charge trapping into the Al2O3 blocking layer. The model reproduces threshold voltage shifts measured at different temperatures on different MANOS stacks.