Multisubband Electron Mobility in Parabolic Coupled Double Quantum Well Structure

A. K. Sahu, N. Sahoo
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Abstract

We compute numerically electron mobility µ as a function of applied electric field F for different doping concentrations Nd in Al0.3Ga0.7As parabolic coupled double quantum well (PCDQW) structure. Here, we consider the effect of ionized impurity (ii-) and alloy disorder (al-) scattering and analyze their respective mobilities µii and µal. We show that as |F| increases from 0 kV/cm, µ enhances and becomes maximum, again decreasing till the end of double subband occupancy. As Nd increases µii enhances but µal decreases at a higher rate as compared to µii resulting reduction in µ during single subband occupancy for the higher value of doping concentrations.
抛物耦合双量子阱结构中的多子带电子迁移率
本文数值计算了Al0.3Ga0.7As抛物耦合双量子阱(PCDQW)结构中不同掺杂浓度Nd的电子迁移率µ与外加电场F的关系。在这里,我们考虑了离子杂质(ii-)和合金无序(al-)散射的影响,并分析了它们各自的迁移率µii和µal。我们发现,当|F|从0 kV/cm开始增加时,µ增大并达到最大值,然后再次减小,直到双子带占用结束。随着Nd的增加,µii增强,而µal以比µii更高的速率下降,导致在掺杂浓度较高的单亚带占用期间µ减少。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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