A Novel Step-Channel TFET for Better Subthreshold Swing and Improved Analog/RF Characteristics

Sachin Kumar, D. Yadav, Somya Saraswat, Nitish Parmar, Ritwik Sharma, Atul Kumar
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引用次数: 8

Abstract

In this paper, a novel device structure is introduced to enhance ON-state current, reduce ambipolar behaviour and better subthreshold swing which is named as step channel tunnel FETs (SC-TFET). This device use small dielectric thickness at source-channel junction to improve device performance. Subthreshold Swing of device is improved due to reduced dielectric thickness at source-channel junction and ambipolar current of device is suppressed by using large dielectric thickness at drainchannel junction. For further improvement of ON-state current high-k dielectric material is introduced as oxide layer which is named as High-K SC-TFET. To analyses device performance characteristics various parameters has been calculated such as parasitic capacitance, transconductance (gm), output transconductance (gds) and cut-off frequency (fT). Finally, a study between conventional TFET, SC-TFET and High-K SC-TFET has been investigated which shows its significant contribution in analog and RF parameters. All the simulations of purpose device have been done using TCAD device simulator.
一种具有更好亚阈值摆幅和改进模拟/射频特性的新型阶梯通道TFET
本文介绍了一种新的器件结构,可以提高导通电流,减少双极行为和更好的亚阈值摆幅,称为阶跃沟道隧道场效应管(SC-TFET)。该器件在源-通道交界处采用小介电厚度,以提高器件性能。减小源沟道结处的介电厚度可改善器件的亚阈值摆幅,增大漏沟道结处的介电厚度可抑制器件的双极电流。为了进一步提高导通电流,引入了高k介电材料作为氧化层,称为高k SC-TFET。为了分析器件的性能特性,计算了寄生电容、跨导、输出跨导和截止频率等参数。最后,对传统TFET, SC-TFET和高k SC-TFET进行了研究,表明其对模拟和射频参数的贡献显著。利用TCAD设备模拟器对目标器件进行了仿真。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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