Symmetry transitions of compressively prestressed long membranes under pressure

O. Paul, T. Kramer
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引用次数: 3

Abstract

This paper reports on the mechanical response of long postbuckled membranes to differential pressure. In the absence of pressure, membranes with Poisson's ratio /spl nu/=0.25 and prestrain /spl epsiv//sub 0/ more compressive than the critical value -17.3 t/sup 2//a/sup 2/, with the membrane thickness t and width a, show a meander-shaped postbuckling profile. With increasing pressure load, the structures undergo a second-order transition to a ripple-shaped profile at a critical pressure p/sub cr1/(/spl epsiv//sub 0/), and to a ripple-free profile at a higher critical pressure p/sub cr2/(/spl epsiv//sub 0/). At each transition, the structures gain additional symmetries. These phenomena were experimentally studied on micromachined PECVD silicon nitride thin film membranes. A variational calculus approach enabled p/sub cr1/(/spl epsiv//sub 0/), p/sub cr2/(/spl epsiv//sub 0/), /spl epsiv//sub 0,cr2/, and the symmetry contributions to the membrane profiles to be computed. Based on the numerical results, the prestrain and elastic modulus of a PECVD silicon nitride thin film were extracted as /spl epsiv//sub 0/=-1.78/spl times/10/sup -3/ and E=160 GPa, respectively.
压力下压缩预应力长膜的对称转变
本文报道了长后屈曲膜对压差的力学响应。在无压力条件下,当泊松比/spl nu/=0.25、prestrain /spl epsiv// sub0 /比临界值-17.3 t/sup 2//a/sup 2/时,膜的厚度为t、宽度为a时,膜呈现曲流状后屈曲。随着压力载荷的增加,在临界压力p/sub cr1/(/spl epsiv//sub 0/)下,结构发生二阶过渡,形成波纹形状,在较高临界压力p/sub cr2/(/spl epsiv//sub 0/)下,结构形成无波纹形状。在每一次过渡中,结构获得额外的对称性。在微机械加工的PECVD氮化硅薄膜上对这些现象进行了实验研究。利用变分演算方法,可以计算p/sub cr1/(/spl epsiv//sub 0/)、p/sub cr2/(/spl epsiv//sub 0/)、/spl epsiv//sub 0、cr2/以及对称对膜剖面的贡献。基于数值计算结果,得到PECVD氮化硅薄膜的预应变和弹性模量分别为/spl epsiv//sub 0/=-1.78/spl × /10/sup -3/和E=160 GPa。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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