Time and temperature dependence of the drain current of PF-based OFETs

M. Hamilton, J. Kanicki
{"title":"Time and temperature dependence of the drain current of PF-based OFETs","authors":"M. Hamilton, J. Kanicki","doi":"10.1109/DRC.2005.1553093","DOIUrl":null,"url":null,"abstract":"We have studied the effects of bias temperature stress (BTS) on organic field-effect transistors (OFETs) in accumulation (negative stress bias) and depletion (positive stress bias) using both dc and ac stress biases. The device studied is an inverted, gate-planarized, co-planar thin-film transistor that has been previously described [1]. Indium tin oxide (ITO) was used for the source and drain contacts and benzocyclobutene (BCB) / amorphous silicon nitride was used for the gate-planarization / insulator. The organic semiconductor F8T2 (poly 9,9-dioctylfluorene-co-bithiophene) was deposited by spin-coating from xylenes solution. These devices exhibit typical p-type field-effect transistor behavior. Typical values of the linear regime field-effect mobility, threshold voltage, and subthreshold swing for these devices are: 5x10-3 cm2/Vs, -20 V, and 3.0 V/decade respectively. All measurements were performed in the dark and in air using an HP4156 connected to a Karl Suss PM-8 probe station with a temperature-controlled chuck. For the case of negative dc BTS over long time scales (>104sec), we have used both interrupted and noninterrupted stress methods measured over a range of temperatures (293K < T < 353K). The major observable effect is a shift of the threshold voltage to more negative values as the stress time accumulates, causing a decrease in the drain current at a specific applied gate bias. The observed dependence on stress temperature is analyzed in terms of the kinetics of the stress mechanism. This analysis is performed by unifying the threshold voltage shift curves through either the normalization of the accumulated stress time by a thermally activated time constant for the stress or by using the thermalization energy [2,3]. We note that the values of both the activation energy of the time constant and the thermalization energy are approximately 0.25eV. We propose that this energy corresponds to the peak of a density of trap states above the valence band/HOMO level of F8T2. The observed bias stress effects are reversible at room temperature in the dark. However, recovery of the device is accelerated at elevated temperatures and by illumination with strongly absorbed illumination, as has been observed by others [4], indicating charge trapping/de-trapping as the general stress/recovery mechanism. For the case of positive dc BTS, we observe an unexpected shift of the threshold voltage towards more negative values as well as a significant degradation of the subthreshold swing, while the field-effect mobility is left unchanged throughout the duration of the positive BTS. The effects of the positive BTS are also reversible and we have observed that the recovery of the threshold voltage lags the recovery of the subthreshold swing. This is a possible indication that there are at least two competing stress mechanisms occurring in this device for positive BTS. We propose that there is an additional threshold voltage shift due to the movement of charged species in the insulator (presumably in the BCB) under the influence of positive applied stress bias. We have also investigated the effects of pulsed (ac) BTS in both the accumulation and depletion regimes over a range of pulse frequencies (10 to 100Hz) with a base value of OV and a duty cyde of 50%. In each case, the observed effect is a threshold voltage shift, while the field-effect mobility remains constant. For negative ac BTS, the threshold voltage shifts are similar to that observed for dc BTS if the effective stress time is taken into account. For positive ac BTS, we observe that, for this device, there is a small negative threshold voltage shift which maximizes relatively quickly (compared to the negative BTS case). After a short time, the threshold voltage shift begins to swing back towards a positive threshold voltage shift. For the range of pulse frequencies used here, the threshold voltage shift does not seem to exhibit any discemable dependence on the pulse frequency. It is interesting to note that, while the threshold voltage shifts describe an undesirable instability of these devices, the subthreshold swing appears to decrease as the stress progresses for all of the ac BTS measurements, though further experiments are necessary to fully describe this effect and its dependence on the ac bias stress conditions. In condusion, we have performed and analyzed positive (depletion) and negative (accumulation) BTS using both ac and dc stress bias signals. For each case, the major observable effect is a threshold voltage shift caused by either the trapping of charge carriers in the organic semiconductor or, in the case of positive BTS, the movement of charged species in the organic insulator becomes suspect The results have been successfully analyzed using thermalization energy and kinetics concepts.","PeriodicalId":306160,"journal":{"name":"63rd Device Research Conference Digest, 2005. DRC '05.","volume":"273 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"63rd Device Research Conference Digest, 2005. DRC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2005.1553093","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

We have studied the effects of bias temperature stress (BTS) on organic field-effect transistors (OFETs) in accumulation (negative stress bias) and depletion (positive stress bias) using both dc and ac stress biases. The device studied is an inverted, gate-planarized, co-planar thin-film transistor that has been previously described [1]. Indium tin oxide (ITO) was used for the source and drain contacts and benzocyclobutene (BCB) / amorphous silicon nitride was used for the gate-planarization / insulator. The organic semiconductor F8T2 (poly 9,9-dioctylfluorene-co-bithiophene) was deposited by spin-coating from xylenes solution. These devices exhibit typical p-type field-effect transistor behavior. Typical values of the linear regime field-effect mobility, threshold voltage, and subthreshold swing for these devices are: 5x10-3 cm2/Vs, -20 V, and 3.0 V/decade respectively. All measurements were performed in the dark and in air using an HP4156 connected to a Karl Suss PM-8 probe station with a temperature-controlled chuck. For the case of negative dc BTS over long time scales (>104sec), we have used both interrupted and noninterrupted stress methods measured over a range of temperatures (293K < T < 353K). The major observable effect is a shift of the threshold voltage to more negative values as the stress time accumulates, causing a decrease in the drain current at a specific applied gate bias. The observed dependence on stress temperature is analyzed in terms of the kinetics of the stress mechanism. This analysis is performed by unifying the threshold voltage shift curves through either the normalization of the accumulated stress time by a thermally activated time constant for the stress or by using the thermalization energy [2,3]. We note that the values of both the activation energy of the time constant and the thermalization energy are approximately 0.25eV. We propose that this energy corresponds to the peak of a density of trap states above the valence band/HOMO level of F8T2. The observed bias stress effects are reversible at room temperature in the dark. However, recovery of the device is accelerated at elevated temperatures and by illumination with strongly absorbed illumination, as has been observed by others [4], indicating charge trapping/de-trapping as the general stress/recovery mechanism. For the case of positive dc BTS, we observe an unexpected shift of the threshold voltage towards more negative values as well as a significant degradation of the subthreshold swing, while the field-effect mobility is left unchanged throughout the duration of the positive BTS. The effects of the positive BTS are also reversible and we have observed that the recovery of the threshold voltage lags the recovery of the subthreshold swing. This is a possible indication that there are at least two competing stress mechanisms occurring in this device for positive BTS. We propose that there is an additional threshold voltage shift due to the movement of charged species in the insulator (presumably in the BCB) under the influence of positive applied stress bias. We have also investigated the effects of pulsed (ac) BTS in both the accumulation and depletion regimes over a range of pulse frequencies (10 to 100Hz) with a base value of OV and a duty cyde of 50%. In each case, the observed effect is a threshold voltage shift, while the field-effect mobility remains constant. For negative ac BTS, the threshold voltage shifts are similar to that observed for dc BTS if the effective stress time is taken into account. For positive ac BTS, we observe that, for this device, there is a small negative threshold voltage shift which maximizes relatively quickly (compared to the negative BTS case). After a short time, the threshold voltage shift begins to swing back towards a positive threshold voltage shift. For the range of pulse frequencies used here, the threshold voltage shift does not seem to exhibit any discemable dependence on the pulse frequency. It is interesting to note that, while the threshold voltage shifts describe an undesirable instability of these devices, the subthreshold swing appears to decrease as the stress progresses for all of the ac BTS measurements, though further experiments are necessary to fully describe this effect and its dependence on the ac bias stress conditions. In condusion, we have performed and analyzed positive (depletion) and negative (accumulation) BTS using both ac and dc stress bias signals. For each case, the major observable effect is a threshold voltage shift caused by either the trapping of charge carriers in the organic semiconductor or, in the case of positive BTS, the movement of charged species in the organic insulator becomes suspect The results have been successfully analyzed using thermalization energy and kinetics concepts.
基于pf的ofet漏极电流的时间和温度依赖性
我们使用直流和交流应力偏置研究了偏置温度应力(BTS)对有机场效应晶体管(ofet)在积累(负应力偏置)和耗尽(正应力偏置)下的影响。所研究的器件是一种倒置的、栅极平面化的、共面薄膜晶体管,以前被描述为[1]。源极和漏极触点采用氧化铟锡(ITO),栅极-平面化/绝缘子采用苯并环丁烯(BCB) /非晶氮化硅。采用自旋镀膜的方法,在二甲苯溶液中沉积了有机半导体F8T2(聚9,9-二辛基芴-二噻吩)。这些器件表现出典型的p型场效应晶体管行为。这些器件的线性区场效应迁移率、阈值电压和亚阈值摆幅的典型值分别为:5 × 10-3 cm2/Vs、-20 V和3.0 V/ 10年。所有测量都在黑暗和空气中进行,使用HP4156连接到带有温控卡盘的Karl Suss PM-8探针站。对于长时间尺度(bbb104sec)的负直流BTS,我们使用了在温度范围(293K < T < 353K)内测量的中断和非中断应力方法。可观察到的主要效应是,随着应力时间的积累,阈值电压向更负的值移动,导致在特定施加的栅极偏压处漏极电流减少。从应力机制的动力学角度分析了观察到的对应力温度的依赖性。这种分析是通过统一阈值电压位移曲线来完成的,要么通过热激活时间常数对应力的累积应力时间进行归一化,要么使用热化能[2,3]。我们注意到时间常数的活化能和热化能的值都约为0.25eV。我们认为这个能量对应于F8T2价带/HOMO能级以上的陷阱态密度峰值。观察到的偏置应力效应在室温下是可逆的。然而,正如其他人所观察到的那样,在高温和强吸收照明下,器件的恢复会加速,这表明电荷捕获/去捕获是一般的应力/恢复机制。对于正直流BTS,我们观察到阈值电压意外地向负值移动,以及亚阈值摆幅的显著退化,而场效应迁移率在正BTS的整个持续时间内保持不变。正BTS的影响也是可逆的,我们已经观察到阈值电压的恢复滞后于亚阈值摆幅的恢复。这是一个可能的迹象,至少有两个竞争的压力机制发生在该装置的阳性BTS。我们提出,在正施加应力偏压的影响下,由于绝缘体中带电物质的运动(可能在BCB中),存在额外的阈值电压位移。我们还研究了脉冲(交流)BTS在脉冲频率(10至100Hz)范围内的积累和耗尽机制的影响,其基本值为OV,占空比为50%。在每种情况下,观察到的效应都是阈值电压移动,而场效应迁移率保持不变。对于负交流BTS,如果考虑到有效应力时间,则阈值电压位移与直流BTS相似。对于正交流BTS,我们观察到,对于该器件,存在一个较小的负阈值电压位移,其相对较快地达到最大值(与负BTS情况相比)。在短时间后,阈值电压位移开始向正的阈值电压位移回摆。对于这里使用的脉冲频率范围,阈值电压移位似乎不表现出任何可察觉的依赖于脉冲频率。值得注意的是,虽然阈值电压位移描述了这些器件的不稳定性,但对于所有交流BTS测量,阈值下摆幅似乎随着应力的增加而减少,尽管需要进一步的实验来充分描述这种影响及其对交流偏置应力条件的依赖。总之,我们已经使用交流和直流应力偏置信号执行和分析了正(耗尽)和负(积累)BTS。对于每种情况,主要观察到的效应是由有机半导体中载流子的捕获引起的阈值电压位移,或者在正极BTS的情况下,有机绝缘体中带电物质的运动变得可疑。结果已经成功地使用热化能和动力学概念进行了分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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