Optimization of 4T Pixel Structure BiCMOS Detectors using y-parameter Representation

Johan Venter, S. Sinha
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Abstract

This paper introduces a mathematical relation between ac performance of the four-transistor (4T) pixel structure detector, which can be used to develop optimised detectors pre-manufacturing. The input to this model is the photon-generated current and the output is a voltage signal derived using small-signal analysis with y-parameter representation to accommodate feedback. The proposed methodology used to develop this model will show the ac performance of 4T pixel structure detectors using process-dependent and process-independent parameters. A 0.35 µm SiGe BiCMOS process's parameters were inserted together with reasonable process-independent parameters and simulation results were obtained. Two different configurations were used in this work. Simulation results are presented where the aspect ratio of the MOSFETs, bias voltage and temperature are varied. Using this work, detector designers can select the desired transresistance gain and then calculate the required process-dependent and process-independent parameters. Since many parameters are applicable, it is proposed that a set of parameters of one integrated circuit process be inserted (fixed) and then process-independent parameters can be calculated by the designer.
利用y参数表示优化4T像素结构BiCMOS探测器
本文介绍了四晶体管(4T)像素结构探测器交流性能之间的数学关系,可用于开发优化的探测器预制造。该模型的输入是光子产生的电流,输出是电压信号,使用y参数表示的小信号分析来适应反馈。用于开发该模型的建议方法将显示使用过程相关和过程无关参数的4T像素结构探测器的交流性能。插入了0.35µm SiGe BiCMOS工艺参数以及合理的工艺无关参数,得到了仿真结果。在这项工作中使用了两种不同的配置。仿真结果显示了mosfet的宽高比、偏置电压和温度的变化。利用这项工作,检测器设计人员可以选择所需的跨电阻增益,然后计算所需的工艺相关和工艺无关参数。由于适用的参数比较多,建议先插入(固定)某一集成电路工艺的一组参数,然后由设计者计算出与工艺无关的参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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